{"id":2723,"date":"2020-05-19T15:42:56","date_gmt":"2020-05-19T06:42:56","guid":{"rendered":"https:\/\/connect.nissha.com\/filmdevice\/?page_id=2723"},"modified":"2024-12-20T18:55:52","modified_gmt":"2024-12-20T09:55:52","slug":"photolithography-etching","status":"publish","type":"page","link":"https:\/\/connect.nissha.com\/filmdevice\/en\/photolithography-etching\/","title":{"rendered":"Etching"},"content":{"rendered":"
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Electrodes and wiring patterns are processed by a roll-to-roll etching process.

\n Our strength is that we have two processes, photolithography and screen resist, and can process with high precision<\/p>\n<\/div>\n

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Photo etching process<\/h2>\n
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Standard specifications<\/h4>\n\n\n\n\n\n\n
Film forming material<\/th>\nVarious metals such as ITO, Cu, Ni and their alloys<\/td>\n<\/tr>\n
Base film<\/th>\nCOP (ITO \/ Cu), PET (ITO, Cu alloy, etc.)<\/td>\n<\/tr>\n
Mask size<\/th>\n500\u00d7500\u339c<\/td>\n<\/tr>\n
Processing accuracy<\/th>\nLine\/Space =10\/10µm<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

Please consult us about the patterning and post-processing of other materials from the inquiry form.<\/p>\n

ITO \/ Cu thin film patterning<\/h3>\n

High-precision wiring processing with Line \/ Space = 10 \/ 10\u00b5m, double-sided processing, and large area are available.<\/p>\n

Photo etching processing flow<\/h4>\n

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Double-sided patterning<\/h4>\n

It can be processed on both sides of the film, not just one side. Alignment with an accuracy of 10um or less is achieved.<\/p>\n

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Handling large areas<\/h4>\n
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Supports large area patterning with a mask size of up to 500 x 1,000mm
It responds to a wide range of needs such as multi-cavity for mass production and production of large modules.<\/p>\n<\/p><\/div>\n

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Cu alloy thin film patterning<\/h3>\n

We can also pattern copper alloy thin films used for strain gauges.<\/p>\n

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Raw material
Cu alloy thin film (t = 100-200nm) \/ Base film (PET)
mask size 500 \u00d7 500\u339c
Post-process such as insulation coating processing and individual cutting is also possible.<\/p>\n<\/p><\/div>\n

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See details\"\"<\/a><\/p>\n<\/div>\n<\/div>\n

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Screen resist etching process<\/h2>\n
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We have a process for resist processing by screen printing.

Since no photomask is required, low-cost production is possible.<\/p>\n<\/p><\/div>\n

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Standard specifications<\/h4>\n\n\n\n\n\n\n
Film forming material<\/th>\nITO<\/td>\n<\/tr>\n
Base film<\/th>\nPET<\/td>\n<\/tr>\n
Screen size<\/th>\n500\u00d7500\u339c<\/td>\n<\/tr>\n
Processing accuracy<\/th>\nLine\/Space =50\/50µm<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

Please consult us on the inquiry form for patterning and post-processing of other materials.<\/p>\n

Process of resist processing by screen printing<\/h4>\n

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<\/p>\n

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Respond customer’s various processing needs<\/h2>\n
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  • Transparent film heater<\/li>\n
  • Film antenna (transparent, mesh)<\/li>\n
  • Capacitive touch sensor: High precision patterning of touch sensor and frame wiring<\/li>\n
  • Large-area panel sensor array: Sensor patterns are arranged at arbitrary positions. Pressure sensor, temperature sensor, etc.<\/li>\n
  • LED lighting electrode<\/li>\n<\/ul>\n

    \"\"<\/p>\n<\/p><\/div>\n<\/div>\n","protected":false},"excerpt":{"rendered":"

    Electrodes and wiring patterns are processed by a roll-to-roll etching process. Our strength is that we have t […]<\/p>\n","protected":false},"author":4,"featured_media":0,"parent":9611,"menu_order":0,"comment_status":"closed","ping_status":"closed","template":"page-thin_film_device_en.php","meta":{"_acf_changed":false,"footnotes":""},"class_list":["post-2723","page","type-page","status-publish","hentry"],"acf":[],"aioseo_notices":[],"aioseo_head":"\n\t\t\n\t\n\t\n\t\n\t\t\n\t\t